AIXTRON MOCVD system certified by AMS OSRAM, accelerating Micro LED mass production
全球领先的光学解决方案供应商艾迈斯欧司朗和半导体行业沉积设备领先供应商爱思强近日联合宣布，200mm晶圆AIXTRON G5+ C和G10-AsP系统已获得艾迈斯欧司朗的认证，可用于满足Micro LED应用需求。
AIXTRON's MOCVD systems AIX G5+ C and the new G10-AsP provide Planetary Technology, a floating satellite-style horizontal rotation technology, paving the way for next-generation high-resolution Micro LED displays.
It is reported that as early as Q1 2022, AMS OSRAM announced a plan to expand production capacity for 200mm wafers, achieving LED and Micro LED production capacity at its existing factory in Malaysia. MOCVD systems are expected to help achieve mass production of Micro LEDs, creating next-generation display applications.
Robert Feurle, Executive Vice President and Head of Optoelectronics Semiconductor Business at OSRAM stated:
Epiq and AMS OSRAM maintain a long-term partnership; we are familiar with their equipment's performance and quality standards. For demanding projects, such as development and production of Micro LED for AsP and GaN devices, Epiq is exactly the partner we need.
Dr. Felix Grawert, CEO and President of Cree Inc., added :
G10-AsP and AIX G5+ C have successfully obtained OSRAM Certification, which is a very important milestone in our company's history. OSRAM is a global leading LED manufacturer, fully capable of bringing the new foundational technology to market. We are facing a major transition from traditional display technologies to new Micro LED display technologies. Today, Aixtron is entering a future growth market with huge potential, and we have an ideal partner to move forward with us.
Micro LED offers significant advantages, such as higher pixel density, longer lifespan, higher luminance, faster switching speeds, and a wider color gamut , further advancing display technology. Low power consumption is also a key advantage, making Micro LED technology ideal for next-generation consumer electronics with smaller displays, which typically have very limited space for batteries.
Micro LED has special production requirements: its mass production process includes a special batch transfer step where thousands of micrometer-sized LED chips (arrays) are picked and placed. Any defect can lead to pixel necrosis, rendering the entire array useless. Therefore, an almost error-free epitaxy process must be used to minimize defects, support high yield rates, and enable economically viable Micro LED production.
According to the introduction, Aixtron's new G10-AsP epitaxy tool has been meticulously designed to meet the specific needs of this application. This brand-new tool is the world's first fully automated AsP reactor, offering fully automated cassette-to-cassette wafer loading and an in-situ etching-based cleaning mechanism. The combination of these two features will have a significant impact on yield.
In addition, the batch reactor technology brings multiple advantages to the Aixtron system: its production cost per wafer is among the lowest in the current market, while its throughput per unit cleanroom area is at the highest level. At the same time, this new tool features precise flow and temperature control, maintaining excellent material uniformity during continuous operation.
Source: ams OSRAM